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Refereed Articles |
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Morphological Evolution of ZnO Thin Films Deposited by Reactive Sputtering
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| The morphological evolution of ZnO thin films deposited by magnetron sputtering has been investigated
on two types of substrates, (111) textured Pt and (100) Si possessing a native oxide. The ZnO films are oriented
with the c-axis [0001] normal to the substrate and possess varying degrees of crystallinity. The films have a columnar
structure with column diameters in the range of 40-300 nm. As observed by field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM), and X-ray diffraction, the film microstructure is strongly dependent on substrate temperature during deposition in the range from near room temperature up to 700 °C and is also dependent on substrate type. A textured film of platinum promotes nucleation thereby improving the crystallinity and texture of sputtered ZnO films. A mechanism for morphological evolution of the films via surface diffusion is proposed based on atom mobilities. |
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